Nearfield Instruments Signs Multi-Year Development Project to Advance Semiconductor Metrology
By API User
ROTTERDAM, The Netherlands, Nov. 18, 2025 (GLOBE NEWSWIRE) — Nearfield Instruments, the leader in 3D, non-destructive, in-line process control solutions based on scanning probe technology, today announced a strategic development project to accelerate innovation in semiconductor metrology. As part of a multi-year collaboration, Nearfield Instruments will deploy its flagship system, QUADRA, at Imec’s advanced R&D facility … Continued